Is this possible? Process control with feedback loops and a changing target value

[Thymes]

Hello everyone,

I am planning a research project and I need to know, whether LabVIEW is able to fulfill the one core requirement that is necessary for the work.

So, I don’t need to know how to actually implement a solution (yet), a ‘yes, this is possible’ or a ‘no, this is not possible’ is enough 🙂

We have a certain process and gather a lot of data during the process. Say, the primary quality attribute is the size of the particles within this process. We would like to implement a process control in which certain target values at certain time points are set (e.g. 700 µm at 15 min, 850 µm at 90 min, and 1090 µm at 240 min) and LabVIEW adapts the process settings to reach the required particle size at the right time. Is this possible with LabVIEW?

I couldn't find anything about that kind of process control.

Thank you!

Thymes

[LV_Pro]

Yes.

It rarely is whether it is possible to do in LabVIEW, rather what is required, both in software toolkits, hardware and programmer's knowledge. The particle accelerator at CERN is largely controlled by LabVIEW programs, as an example. What you are very broadly describling sounds very doable, if the right components are used.

[Thymes]

Thank you for your quick answer!

This is what I was hoping for 🙂

If we get the funding, I will most definately be back 🙂