ID: TS6391
Abstract: Plasma processing is a key step in device fabrication with semiconductor wafers. The uniformity of plasma is an important performance metric of the manufacturing equipment that affects the wafer yield. Tokyo Electron’s Austin Plasma Lab is developing noninvasive techniques to determine the uniformity of plasma that can be used to optimize the performance of the equipment. Learn how Tokyo Electron engineers are using the LabVIEW platform with an NI PXIe-1075 chassis to acquire images to correlate to the RF and spectroscopy measurements of the plasma. Graftek Imaging has partnered with Tokyo Electron to develop the image analysis methods for quantifying the plasma uniformity
Speakers:
Megan Doppel, Tokyo Electron America, Systems Design Engineer
Vivian Le, Graftek Imaging, Application Engineer
